Izquierdo, R.; Lavoie, C. et Meunier, M.
(1990).
« Excimer laser direct writing of titanium lines on lithium niobate ».
Applied Physics Letters, 57(7), pp. 647-649.
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Résumé
We have investigated the deposition of titanium lines from titanium tetrachloride (TiCl4) onto lithium niobate (LiNbO3). The deposition is induced using a KrF excimer laser (λ=248 nm). Our objective is the formation of titanium indiffused LiNbO3optical waveguides. The titanium lines contain little chlorine ([Cl] <2 at. %) and are typically 20–100 nm thick, and 3–20 μm wide. We find that the process is controlled by photochemistry of TiCl4. However it is difficult, at this point, to detemine whether the gas or the adsorbed layer is the primary source of thin‐film growth.